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high-vacuum metal deposition

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  • Ultra high vacuum — (UHV) is the vacuum regime characterised by pressures lower than about 10−7 pascal or 100 nanopascals ( 10−9 torr). UHV requires the use of special materials in creating the vacuum system, extreme cleanliness to maintain the vacuum system, and… …   Wikipedia

  • Vacuum engineering — deals with technological processes and equipment that use vacuum to achieve better results than those run under atmospheric pressure. The most widespread applications of vacuum technology are: * Pyrolytic Chromium Carbide Coating * Antireflecting …   Wikipedia

  • Vacuum — This article is about empty physical space or the absence of matter. For other uses, see Vacuum (disambiguation). Free space redirects here. For other uses, see Free space (disambiguation). Pump to demonstrate vacuum In everyday usage, vacuum is… …   Wikipedia

  • Vacuum pump — A vacuum pump is a device that removes gas molecules from a sealed volume in order to leave behind a partial vacuum. The vacuum pump was invented in 1650 by Otto von Guericke. Types Pumps can be broadly categorized according to three… …   Wikipedia

  • vacuum technology — Introduction       all processes and physical measurements carried out under conditions of below normal atmospheric pressure. A process or physical measurement is generally performed in a vacuum for one of the following reasons: (1) to remove the …   Universalium

  • High Power Impulse Magnetron Sputtering — (HIPIMS, also known as High Impact Power Magnetron Sputtering and High Power Pulsed Magnetron Sputtering, HPPMS) is a method for physical vapor deposition of thin films which is based on magnetron sputter deposition. HIPIMS utilises extremely… …   Wikipedia

  • Electron beam physical vapor deposition — or EBPVD is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous… …   Wikipedia

  • Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in …   Wikipedia

  • Evaporation (deposition) — Evaporation machine used for metallization at LAAS technological facility in Toulouse, France. Evaporation is a common method of thin film deposition. The source material is evaporated in a vacuum. The vacuum allows vapor particles to travel… …   Wikipedia

  • Electron beam induced deposition — (EBID) is a process of decomposing gaseous molecules by electron beam leading to deposition of non volatile fragments onto a nearby substrate. Process Focused electron beam of scanning electron microscope (SEM) or scanning transmission electron… …   Wikipedia

  • Thin-film deposition — is any technique for depositing a thin film of material onto a substrate or onto previously deposited layers. Thin is a relative term, but most deposition techniques allow layer thickness to be controlled within a few tens of nanometers, and some …   Wikipedia

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